产品介绍：
Technical Notes:
1.CVD precursor for platinum thin film deposition 3,4
2.Used for deposition of Pt nanoparticle using CVD method 6-7
References:
1.J. Organomet. hem.1970, 24, 501
2.z. Naturforsch. B, 1963 18, 507
3.Appl Phys. L ett.1988. 53, 1591
4.Chem. Mater.1992. 4.162
5.Chem. Mater.1991. 3, 677
6.J. Mater. C hem.2006, 16, 2464
7.ECS Trans. 2009, 25, 763
