产品介绍：
Technical Notes
1.Organometallic precursor for chemical vapour deposition (CVD) of Pt films 1-3
References:
1.Chem. Vap. Deposition, 2003, 9, 321.
2.Jpn. J. Appl. Phys., 2004, 43, L624.
3.J. Vac. Sci. Technol. A, 2007, 25, 104.
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Technical Notes
1.Organometallic precursor for chemical vapour deposition (CVD) of Pt films 1-3
References:
1.Chem. Vap. Deposition, 2003, 9, 321.
2.Jpn. J. Appl. Phys., 2004, 43, L624.
3.J. Vac. Sci. Technol. A, 2007, 25, 104.
Strem
