产品介绍：
Technical Notes:
1.Carbonyl precursor for the deposition of rhenium thin films by CVD and ALD with high volatility.
References:
1.J .Chem. Soc..1958 4314.
2.J .Struct. Chem.. 2009 50 1 126.
3.J .Chem. The rmodynamics.2011 43 1646.
| |
Technical Notes:
1.Carbonyl precursor for the deposition of rhenium thin films by CVD and ALD with high volatility.
References:
1.J .Chem. Soc..1958 4314.
2.J .Struct. Chem.. 2009 50 1 126.
3.J .Chem. The rmodynamics.2011 43 1646.
Strem
