产品介绍：
Technical Notes:
1. AL D/CVD precursor for gallium thin film deposition
References:
1. Polyhedron 1990, 9, 257
2. J. Vac. Sci. Technol. A, 1996, 14, 306
3. Chem. Mater. 2006, 18, 471
4.ECS Trans. 2009, 25, 617
5.Dalton Trans.. 2017, 46, 16551
6.J. Mater. Chem.. 2007, 17, 1308
7.J Vac. Sci. Technol. A, 2019, 37, 030906
8.ACS Appl. Energy Mater. 2020, 3, 7208
9.Chem. Mater. 2014., 26, 1 029
10. Mater. Today hem. 2018, 10, 142
11. J Mater. Chem. C, 2020, 8. 8457
