Bis(mu-dimethylamino)tetrakis(dimethylamino)digallium

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产品介绍：

Technical Notes:

1. AL D/CVD precursor for gallium thin film deposition

References:

1. Polyhedron 1990, 9, 257

2. J. Vac. Sci. Technol. A, 1996, 14, 306

3. Chem. Mater. 2006, 18, 471

4.ECS Trans. 2009, 25, 617

5.Dalton Trans.. 2017, 46, 16551

6.J. Mater. Chem.. 2007, 17, 1308

7.J Vac. Sci. Technol. A, 2019, 37, 030906

8.ACS Appl. Energy Mater. 2020, 3, 7208

9.Chem. Mater. 2014., 26, 1 029

10. Mater. Today hem. 2018, 10, 142

11. J Mater. Chem. C, 2020, 8. 8457

Strem

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