Technical Note:
1. Silicon oxide source for rapid atomic layer deposition to prepare various nanolaminates.
References:
1. Nanoscale, 2013, 5, 11 856.
2.Mater. Research Bulletin, 2012, 47, 3004.
Technical Note:
1. Silicon oxide source for rapid atomic layer deposition to prepare various nanolaminates.
References:
1. Nanoscale, 2013, 5, 11 856.
2.Mater. Research Bulletin, 2012, 47, 3004.
Strem