产品介绍：
Technical Notes:
1. An overlooked atomic layer deposition precursor.
2. Stoichiometric and catalytic Si-N bond formation using the p-block base TDMAA.
References:
1. Journal of Vacuum Science & Technology, A: Vacuum, Surfaces and Films, 2017, 35, 01B1 28/1.
2. Dalton Transactions, 2015, 44, 12112.
