Dimethylaluminum i-propoxide

产品介绍：

Technical Notes：

Used as MOCVD precursor for making of CoAl2O4 films ^[1], AL D precursor for making of Al2Os films 2-6, 8-10, and as a Al doping source for ZnO films ^[7]

References:

1.Electrochimica Acta, 2005, 50, 4592

2.J. Kor. Phys. Soc., 2006, 48, 131

3.Thin Solid Films, 2010, 518, 3658

4.J. Vac. Sci. Technol. A, 2012, 3o, 021505

5.Chem. Mater. 2013, 25, 4619

6.J. Vac. Sci. Technol. A, 2014, 32, 021514

7.J. Mater. Chem. c, 2015,3, 3095

8.Thin Solid Films, 201 7, 641, 47

Strem

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