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Phosphorus implant in silicon depth profile standard

货号
NIST2133
规格纯度
NIST® SRM® 2133
参考价格
34489 *本价格含增值税费
促销
数量
-+
产品介绍:

产品说明

一般描述

This Standard Reference Material (SRM) is intended for use in calibrating secondary ion response to minor and trace levels of phosphorus in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). SRM 2133 is intended for calibrating the response of a SIMS instrument for phosphorus in a silicon matrix under a specific set of instrumental conditions. It may also be used by a laboratory as a transfer standard for the calibration of working standards of phosphorus in silicon. This SRM consists of a 1 cm × 1 cm single crystal silicon substrate that has been ion-implanted with the isotope 31P at a nominal energy of 100 keV. For more information, please refer to the COA and SDS.

SRM 2133_cert SRM 2133 _SDS

法律信息

NIST is a registered trademark of National Institute of Standards and Technology
SRM is a registered trademark of National Institute of Standards and Technology

基本信息

NACRESNA.24

产品性质

质量水平100
等级certified reference material
包装pkg of each
manufacturer/tradenameNIST®
application(s)pharmaceutical (small molecule)
格式matrix material

安全信息

储存分类代码13 - Non Combustible Solids
WGKWGK 3
闪点(F)Not applicable
闪点(C)Not applicable

Sigma-Aldrich

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