应用
Iron sputtering target is used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

备注
Thickness tolerance: ^+0.015in; Diameter tolerance: +0.020/-0.0in

基本信息

MDL
MFCD00010999

EINECS
231-096-4

灵敏度
Ambient temperatures.

溶解性
Insoluble in water.

安全信息

安全等级
Y

TSCA
是