应用
Can be used as a sputtering target to prepare bubble memory devices.Yttrium aluminum oxide finds application in ceramic, glass and optics due to its thermal stability and insolubility. It is used in the preparation of sputtering bonded targets in chemical processes viz. chemical vapor deposition, atomic thermal and electron beam evaporation. It is also used in solar, water treatment and fuel cell. Further, it is used as coloring and adhesive agents in enamels manufacture.
备注
Incompatible with strong oxidizing agents, halogenated hydrocarbon, strong bases, strong acids, vinyl compounds, ethylene oxide, chlorine trifluoride, oxygen difluoride and sodium nitrate.
基本信息
MDL
MFCD00213958
EINECS
234-465-8
分子式
Y3Al5O12
分子量
593.62
熔点
1760°
密度
4.65
折射率
1.833
灵敏度
Ambient temperatures.
形态
3-12mm Fused Lump
溶解性
Insoluble in water.
安全信息
TSCA
是
